EVIDENT

LEXT-OLS5100 Confocale Laserscanningmicroscoop voor Materiaalanalyse

Referentie: EVI-LEXT-OLS5100

3D confocale lasermicroscoop voor contactloze oppervlaktemetrologie.
De Olympus / Evident LEXT OLS5100 biedt precisie op submicronniveau voor materiaalinspectie en kwaliteitscontrole.

- Gegarandeerde submicronprecisie in 3D-metingen (compatibel met ISO 25178)
- Scannen op hoge snelheid en panoramisch hechten voor een groot dekkingsgebied
- Geavanceerde optiek met lage aberratie over het hele gezichtsveld
- Geautomatiseerde analyse en intuïtieve interface stroomlijnen de bediening
- Geschikt voor metalen, halfgeleiders, polymeren en meer

Gebruikt in R&D en QC in verschillende industrieën. Analis kan het systeem configureren volgens uw inspectiebehoeften.

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LEXT-OLS5100 Confocale Laserscanningmicroscoop voor Materiaalanalyse

Gerelateerde documenten

DOCUMENT NAAM

UITGAVE DATUM

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Brochure EVIDENT LEXT-OLS5100 3D Measuring Laser Microscope EN.pdf

26 / 03 / 2025

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EVIDENT

LEXT OLS5500 3D optische profilometer voor oppervlaktemetrologie

Referentie : EVI-LEXT-OLS5500

The Evident LEXT™ OLS5500 is a hybrid 3D optical profilometer that combines laser scanning microscopy (LSM), white light interferometry (WLI), and focus variation microscopy (FVM) in one platform. It delivers precise, traceable surface measurements from the nanometer to the millimeter scale, enabling confident inspection in R&D, QA, and QC environments.

Designed for challenging materials, including reflective, transparent, steep, or low-contrast surfaces, the OLS5500 provides exceptional clarity, guaranteed accuracy, and repeatable results supported by verifiable calibration. Its advanced WLI mode improves throughput by up to 40× compared to conventional LSM, while dedicated LEXT objectives ensure reliable measurements across complex geometries.

Key Advantages at a Glance

3-in-1 hybrid profilometry (LSM, WLI, FVM) for comprehensive surface analysis
Guaranteed accuracy and repeatability for LSM and WLI measurements*
Nanometer-scale measurement noise (1 nm with LEXT 100X LSM objectives; 0.08 nm with WLI optics)
High-speed WLI acquisition providing up to 40× faster throughput
Advanced optics with high-NA WLI lenses and distortion-free LEXT objectives
4K imaging, contrast enhancement, and shading correction for clear visualization of every surface type
Automated workflows including Smart Scan II, tilt-adjustment assistance, measurement macros, and Smart Judge data filtering

*As specified by Evident, valid after calibration under manufacturer-defined conditions.

Suitable For

The OLS5500 supports accurate, non-contact surface metrology across a wide range of research and industrial needs:

• Semiconductors and MEMS: wafer roughness, step height, pattern fidelity, microcrack detection

• Electronics: copper traces, PCB features, defect and wear analysis

• Polymers and composites: transparent films, layered materials, surface defects

• Metals and alloys: finishing quality, machining evaluation, grain and texture analysis

• Coatings and surface treatments: film thickness, slope measurement, uniformity inspection

Used in R&D, process development, and production QC, the OLS5500 delivers trusted, traceable 3D data for demanding surface characterization workflows.

Download brochure below for full specifications.
Ask Analis local Benelux experts for more information, a demonstration or a personalized quotation.