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- Microscopie Microscopen voor materiaalwetenschappen 3D optische profilometer voor oppervlaktemetrologie
- LEXT OLS5500 3D optische profilometer voor oppervlaktemetrologie
HOME / APPLICATIONS & TECHNIQUES /
LEXT OLS5500 3D optische profilometer voor oppervlaktemetrologie
Referentie: EVI-LEXT-OLS5500
https://www.analis.com/shop/evi-lext-ols5500-3d-optical-profilometer-for-surface-metrology-137821 https://www.analis.com/web/image/product.template/137821/image_1920?unique=fea50a8Key Advantages at a Glance
- 3-in-1 hybrid profilometry (LSM, WLI, FVM) for comprehensive surface analysis
- Guaranteed accuracy and repeatability for LSM and WLI measurements*
- Nanometer-scale measurement noise (1 nm with LEXT 100X LSM objectives; 0.08 nm with WLI optics)
- High-speed WLI acquisition providing up to 40× faster throughput
- Advanced optics with high-NA WLI lenses and distortion-free LEXT objectives
- 4K imaging, contrast enhancement, and shading correction for clear visualization of every surface type
- Automated workflows including Smart Scan II, tilt-adjustment assistance, measurement macros, and Smart Judge data filtering
Suitable For
Ask Analis local Benelux experts for more information, a demonstration or a personalized quotation.
Technische Informatie
|
Category |
Specification |
|
Measurement Principles |
Laser Scanning Microscopy (LSM), White Light Interferometry (WLI), Focus Variation Microscopy (FVM) |
|
Measurement Range |
From nanometer-scale features (WLI/LSM) to millimeter-scale structures (FVM) |
|
Total Magnification |
54× – 17,280× |
|
Field of View |
16 µm – 5,120 µm (depending on objective) |
|
Height Repeatability (LSM) |
0.45 µm (5×), 0.1 µm (10×), 0.03 µm (20×), 0.012 µm (50×/100×) |
|
Height Repeatability (WLI) |
0.3% |
|
Guaranteed Measurement Noise |
1 nm (LSM, MPLAPON 100× LEXT objective) / 0.08 nm (WLI) |
|
Accuracy (LSM) |
0.15 + L/100 μm (L = measurement length) |
|
Surface Topography Repeatability (WLI) |
0.08 nm |
|
Max Points per Measurement |
4096 × 4096 px (up to 400 megapixels stitched) |
|
Stage Travel |
100 × 100 mm (SAF/EAF models) or 300 × 300 mm (LAF model) |
|
Maximum Sample Height |
100 mm (SAF), 210 mm (EAF), 37 mm (LAF) |
|
Laser Source |
405 nm, Class 2 |
|
Color Imaging |
White LED, CMOS sensor |
|
Objective Options |
LEXT LSM objectives (10×–100×), WLI Mirau objectives (10×/20×/50×), long-working-distance variants |
|
Imaging Enhancements |
4K imaging, laser DIC, color DIC, top-surface detection filter, Intelligent Shading Correction |
|
Automation & Workflow Tools |
Smart Scan II, Smart Judge, macro automation, seamless autofocus, tilt-adjustment assistance |
|
Software |
PRECiV (2D/3D analysis, reporting, AI-assisted workflows) |
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Beschermingskasten
Biologische beeldvorming
Bloedplaatjesaggregatie
Capillaire elektroforese
Celculturen en fermentatie
Cellulaire analyse
Centrifugatie
Chromatografie (flash & prep)
DNA / RNA (nucleïnezuren)
Deeltjeskarakterisatie
Desinfectie
Elektrochemie
Flowcytometrie
Flowcytometrie celsorting
Geautomatiseerde Liquid Handling
Hematologie
Immuno-hematologie
Immunodosage
In-vitrofertilisatie (IVF)
Kleur-Appearance en fysische testen
Klinische IT-oplossingen
Klinische automatisering (TLA)
Klinische chemie
Klinische kwaliteitscontroles
Laboratoriummeubilair & ontwerpstudies
Massaspectrometers
Materiaaltesten en -karakterisering
Metrologie
Microbiologie (Klinische)
Microscopie
Monstersvoorbereiding
Nefelometrie
Omgevingscontrole
Opslag
POCT
Pipetteren van vloeistoffen (handmatig)
Pompen
Reinigen
Reometers
Shakers and stirrers
Sterilisatie
Synthese
Tablet testing
Texturometers
Toxicologie
Urineanalyse
Verwarmen & koelen
Viscometers
Vochtanalyse
Vriesdrogen
Waterzuivering
Wegen









